| Publication CODE |
Title |
| NBN EN 62374-1:2010 (2010-11) |
SEMICONDUCTOR DEVICES
PART 1: TIME-DEPENDENT DIELECTRIC BREAKDOWN (TDDB) TEST FOR INTER-METAL LAYERS |
| |
| Price Excl. VAT |
Total number of pages, tables and drawings |
|
25.00 €
|
2 P. |
Description
Describes a test method, test structure and lifetime estimation method of the time-dependent dielectric breakdown (TDDB) test for inter-metal layers applied in semiconductor devices.
|
| Class |
C86
(ELECTRONIC COMPONENTS MICRO ELECTRONICS - DISCRETE SEMICONDUCTORS)
|
Available files
ATTENTION: Belgian registered standards (NBN EN or NBN HD) are generally
only available in English or French. Only the cover page is translated
and the document itself is in English or in French.
Very important notice: 98% of the text of the NBN EN 55XXX,
NBN EN 6XXXX comes from the IEC text which is NOT included.
This text can be ordered here:
IEC 62374-1:2010.
For the series NBN EN 50XXX, the standards are however complete.
|
EN version
|
FR version
|
DE version
|
|
| Status |
Registered trilingual Belgian standard EN or FR or DE |
| Situation |
Currently active
|
|
| Committee |
TC 47
SEMICONDUCTOR DEVICES
|
| Responsible |
Ir DELENS Marc
|
| BEC Approval |
2010-11-01 |
| NBN Approval |
2010-12-17 |
| Belgian Official Journal |
2011-01-19 |
| Registration |
108144 |
| ICS-Code (International Standards Classification) |
31.080
|
| NBN Status |
New |
|
| Date of ratification (d.o.r.) |
2010-11-01 |
| Date of availability (d.a.v.) |
2010-11-19 |
| Date of announcement (d.o.a.) |
2011-02-01 |
| Date of publication (d.o.p.) |
2011-08-01 |
| Date of withdrawal former edition (d.o.w.) |
2013-11-01 |
|
